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<r><article key="journals/mr/AubertRMLF10" mdate="2020-02-22">
<author pid="45/8534">A. Aubert</author>
<author pid="25/8460">J. P. Rebrasse</author>
<author pid="50/2084">Lionel Dantas de Morais</author>
<author pid="06/1964">Nathalie Labat</author>
<author pid="10/1947">H&#233;l&#232;ne Fr&#233;mont</author>
<title>Failure analysis case study on a Cu/low-k technology in package: New front-side approach using laser and plasma de-processing.</title>
<pages>1688-1691</pages>
<year>2010</year>
<volume>50</volume>
<journal>Microelectron. Reliab.</journal>
<number>9-11</number>
<ee>https://doi.org/10.1016/j.microrel.2010.07.036</ee>
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<r><article key="journals/mr/AubertMR08" mdate="2020-02-22">
<author pid="45/8534">A. Aubert</author>
<author pid="50/2084">Lionel Dantas de Morais</author>
<author pid="25/8460">J. P. Rebrasse</author>
<title>Laser decapsulation of plastic packages for failure analysis: Process control and artefact investigations.</title>
<pages>1144-1148</pages>
<year>2008</year>
<volume>48</volume>
<journal>Microelectron. Reliab.</journal>
<number>8-9</number>
<ee>https://doi.org/10.1016/j.microrel.2008.07.004</ee>
<url>db/journals/mr/mr48.html#AubertMR08</url>
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<r><article key="journals/mr/DebledsRMFPM07" mdate="2020-02-22">
<author pid="47/8457">S. Debleds</author>
<author pid="25/8460">J. P. Rebrasse</author>
<author pid="50/2084">Lionel Dantas de Morais</author>
<author pid="65/8458">I. Frapreau</author>
<author pid="59/8457">R. Perdreau</author>
<author pid="70/684">B. Morillon</author>
<title>Localization of sensitive areas of power AC switch under thermal laser stimulation.</title>
<pages>1569-1573</pages>
<year>2007</year>
<volume>47</volume>
<journal>Microelectron. Reliab.</journal>
<number>9-11</number>
<ee>https://doi.org/10.1016/j.microrel.2007.07.018</ee>
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<r><article key="journals/mr/MoraisARR07" mdate="2020-02-22">
<author pid="50/2084">Lionel Dantas de Morais</author>
<author pid="38/8457">F. Allanic</author>
<author pid="03/8459">F. Roqueta</author>
<author pid="25/8460">J. P. Rebrasse</author>
<title>Thermal approach of defects generation on copper/organic dielectric interface due to SEM inspections.</title>
<pages>1614-1618</pages>
<year>2007</year>
<volume>47</volume>
<journal>Microelectron. Reliab.</journal>
<number>9-11</number>
<ee>https://doi.org/10.1016/j.microrel.2007.07.056</ee>
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