Probing stress effects in HfO<sub>2</sub> gate stacks with time dependent measurements.

George A. Brown

Chadwin D. Young Gennadi Bersuker Yuegang Zhao Jeff J. Peterson Joel Barnett George A. Brown Jang H. Sim Rino Choi Byoung Hun Lee Peter Zeitzoff Probing stress effects in HfO<sub>2</sub> gate stacks with time dependent measurements. 806-810 2005 45 Microelectron. Reliab. 5-6 https://doi.org/10.1016/j.microrel.2004.11.043 db/journals/mr/mr45.html#YoungBZPBBSCLZ05

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Gennadi Bersuker Jang H. Sim Chadwin D. Young Rino Choi Peter Zeitzoff George A. Brown Byoung Hun Lee Robert W. Murto Effect of Pre-Existing Defects on Reliability Assessment of High-K Gate Dielectrics. 1509-1512 2004 44 Microelectron. Reliab. 9-11 https://doi.org/10.1016/j.microrel.2004.07.048 db/journals/mr/mr44.html#BersukerSYCZBLM04

Hollis L. Caswell William C. Holton Richard J. Petschauer George A. Brown S. Krishnaswamy Herbert Stopper Daniel H. Carter William Lattin Robert M. Sullivan Edward B. Eichelberger Paul Losleben The Oregon Report Basic Technology. 10-19 1978 11 Computer 9 https://doi.org/10.1109/C-M.1978.218339 http://doi.ieeecomputersociety.org/10.1109/C-M.1978.218339 db/journals/computer/computer11.html#CaswellHPBKSCLS78

Joel Barnett Gennadi Bersuker Daniel H. Carter Hollis L. Caswell Pauline O. Chin Rino Choi Edward B. Eichelberger William C. Holton Qing Hu 0003 S. Krishnaswamy William Lattin Byoung Hun Lee Paul Losleben Robert W. Murto Jeff J. Peterson Richard J. Petschauer Jang H. Sim Herbert Stopper Robert M. Sullivan Chadwin D. Young Peter Zeitzoff Yuegang Zhao